专利内容由知识产权出版社提供
专利名称：METHOD FOR FORMING FILM BY PLASMA
POLYMERIZATION AND APPARATUS FORFORMING FILM BY PLASMAPOLYMERIZATION
发明人：TAKAI, MITSURU,MIYAZAKI, SHINJI,UEDA,
KUNIHIRO,KANAZAWA, HIROMICHI
申请号：EP97950416申请日：19971226公开号：EP0935011A4公开日：20030702
摘要：An electrode coated with a polymeric material at a percentage of covering 50to 100 % is used as the electrode facing that side of a continuous substrate on which afilm is to be formed by plasma polymerization. Plasma polymerization is conductedunder the conditions of an operating pressure of 10-3 to 1 Torr to form a film on thesubstrate. Consequently, the method produces an excellent effect of remarkablysuppressing abnormal discharge during the film formation by plasma polymerization,thus making it possible to stably form a film by plasma polymerization over long andthus improve the yield of the product. The film formed by the plasma polymerization hasextremely good properties.
申请人：TDK CORPORATION
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