专利内容由知识产权出版社提供
专利名称：Gas processing equipment发明人：大石 強申请号：JP20110620申请日：20110413公开号：JP5847424B2公开日：20160120
摘要：PROBLEM TO BE SOLVED: To provide a gas treatment apparatus which is easy tomaintain and capable of reducing running cost and maintenance cost of the
apparatus.SOLUTION: The gas treatment apparatus includes: a plasma reaction part forgenerating a non-equilibrium plasma by electric discharge to treat gas containing harmfulsubstances; a recovery part for contacting the gas treated through the plasma reactionpart with a first treatment water to recover the water-soluble harmful substances in thetreated gas into the first treatment water; a treatment part for supplying a
predetermined vapor under elevated pressure to the first treatment water in which thewater-soluble harmful substances are recovered to obtain a second treatment watercontaining fine bubbles; a separation part for decomposing the water-soluble harmfulsubstances accompanying the extinction of the fine bubbles in the second treatmentwater by storing the second treatment water containing the fine bubbles and exposingthe second treatment water to the atmospheric pressure to separate the secondtreatment water containing suspended solids into the first treatment water and thesuspended solids; and a supply part for supplying the first treatment water separated inthe separation part to the recovery part.
申请人：オリエンタル機電株式会社
地址：大阪府大阪市区南船場４丁目１２番８号
国籍：JP
代理人：西教 圭一郎
更多信息请下载全文后查看
